NSTECH ALD RA-200
CONTACT US
Haziran 22, 2020SECTORS
Temmuz 20, 2023
NSTECH ALD
RA-200
We are by your side with Flexible Design and Software options in ALD [Atomic Layer Deposition] Technology.
Your surface coating is under control with ALD@nstech RA-200
- PLC with HMI Panel or LABVIEW with PC Control
- ALD cycle, SVM cycle, DopedALD cycle
- Real-time data recording during the process
- PID temperature control for reactor, gasline and precursors (optional).
- High speed ALD valves
- 200 mm Substrate size (can be sized according to your expectation)
NSTECH ALD
Why NStech ALD
- Tailor your device to your needs for ALD coating application.
- Excellent ALD film quality
- Operational flexibility
- Perfect coating solution
- ALD is an effective and versatile method for coating parts of various sizes, shapes and uses.
- Improvement for the surface mechanical properties of your products
- Advanced Research
- We offer technology at an affordable price
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